US PLASMA TECHNOLOGY

Lab Scale Sputtering

We offer a Lab Scale / Development Level sputtering system Known as the Sputterglow.

SputterGlow Features

  • Reactive Sputter Deposition of Si3N4 or Other Films
  • Eliminates need for Silane Gas
  • Easy to Facilitate in a Lab, No Hazardous Gases Needed
  • Up to Three Targets
  • Deposit Dielectrics or Metals
  • 200 mm Wafers (or smaller) or 156 mm x 156 mm Solar Cells
  • Heating Options (up to 400 Degrees C)
  • 1200 Watt, 13.56 MHz RF Generator
  • Automatic Tuning
  • Turbo and Backing Pump
  • Water Cooled Magnetron Sputtering
  • Stepper Controlled Substrate Handling
  • Computer or Manual Control of Gauges
  • MFC control of gases
  • LED Diagnostics
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